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ZY
Verified CAS / Academic Author2 Decoded Studies

Prof. ZHOU Ye

Institute for Advanced Study, Shenzhen University, Shenzhen 518060, P. R. China; Department of Electrical Engineering, Incheon National University, Incheon 22012, Republic of Korea

Research Publications & English Decoded Briefs

Showing 2 publications
SCIENCE CHINA Materials2026DOI: 10.1007/s40843-026-4457-y

Reconfigurable Radio-Frequency Microchips Enabled by Two-Dimensional Memristive Switches

The relentless scaling of wireless communication toward millimeter-wave (mmWave) and sixth-generation (6G) systems has exposed fundamental limitations in conventional radio-frequency (RF) switches based on field-effect transistors, p-i-n diodes, and microelectromechanical systems, which suffer from trade-offs among insertion loss, isolation, footprint, power consumption, actuation voltage, and integration complexity. Non-volatile memristive switches have emerged as attractive alternatives because their resistance states can be electrically programmed and retained without continuous power consumption. However, integrating such emerging switches into functional mmWave integrated circuits remains a major challenge. Pazos et al. reported a major step by co-integrating two-dimensional hexagonal boron nitride (hBN) memristive RF switches with a commercial gallium nitride (GaN) high-electron-mobility transistor (HEMT) monolithic microwave integrated circuit (MMIC) platform. Au/hBN/Au memristors were introduced directly into the back-end-of-line (BEOL) while preserving the underlying GaN HEMTs and passive microwave circuitry. The active switching area is approximately 2 μm × 2 μm. The devices exhibited a pristine capacitance of approximately 24.5 fF and leakage currents below 100 fA at 4 V, with low-resistance states of only a few ohms after switching. Cross-sectional transmission electron microscopy revealed a well-defined ~8-nm layered hBN structure before electrical stressing, and a filament-like pathway accompanied by Au penetration after switching to the low-resistance state. The work demonstrates competitive wideband switching performance, high-temperature non-volatility, transistor-assisted programming, continuous RF attenuation, selective signal routing, and frequency-reconfigurable resonators, establishing a new integration paradigm for programmable mmWave electronics.

SCIENCE CHINA Materials2026DOI: 10.1007/s40843-026-4220-x

Suppressing Electrode Diffusion via Interfacial Engineering for High-Temperature Memristors

High-temperature electronics demand non-volatile memories (NVMs) capable of stable operation above 500 °C for applications in space exploration, nuclear energy, and autonomous driving. Conventional silicon-based devices fail above ~250 °C, and silicon carbide (SiC) cannot process data above 300 °C. Memristors offer a promising solution due to their simple structure, low power consumption, and scalability. A recent breakthrough by Yang et al. (Science) demonstrated a graphene (Gra)/HfOx/W memristor achieving data retention at 700 °C, with retention time of 50 h, endurance of 10^9 cycles, ON/OFF ratio exceeding three orders of magnitude, and operation voltage ~1.5 V. The key innovation is replacing the Pt bottom electrode with in-situ grown graphene, which suppresses high-temperature diffusion of the W top electrode through the HfOx layer. In contrast, Pt/HfOx/W devices fail after annealing at 800 °C for 10^4 s due to W migration, forming conductive filaments that lock the device in the ON state. High-resolution TEM and EDS reveal tungsten oxide (WOx) formation at the W/HfOx interface in Pt-based devices, while Gra-based devices show no such degradation. STEM-EELS confirms W migration across the HfOx layer in Pt devices, but graphene acts as a diffusion barrier, preserving stable switching behavior. This interfacial engineering approach provides a viable pathway for high-temperature NVM, addressing the critical bottleneck of electrode diffusion.