Multiscale Ordered Defect Design for Tailoring Ferroelectric Phase Stability and Switching Kinetics in Hafnia Ferroelectrics
Hafnia-based ferroelectrics exhibit a distinctive reverse size effect and exceptional scalability, positioning them as critical candidates for CMOS-compatible non-volatile memory and ferroelectric transistors, with substantial promise for advancing hardware acceleration in artificial intelligence and large-data storage technologies. However, their practical deployment is constrained by a longstanding dilemma: the difficulty in simultaneously stabilizing metastable polar phases and ensuring long-term reliability under the high electric fields required for polarization switching. This review reinterprets this challenge through the lens of defect physics and advocates a paradigm shift from stochastic, disorder-mediated defect incorporation toward ordered, multiscale defect engineering. We systematically discuss the collective influence of point defects, line defects, planar defects, and defect-coupled structures on the phase stability, switching kinetics, and failure mechanisms in hafnia-based ferroelectrics. Controlling oxygen-vacancy states, engineering dopants via Fermi-level and chemical pressure, deploying periodic dislocation arrays, designing topological domain walls, functionalizing interfaces, and leveraging flexoelectric strain gradients constitute the core strategic toolkit. Through such ordered defect architectures, scalable performance metrics, including high remanent polarization, low coercive field, fast switching speed, and endurance exceeding 10^12 cycles, become attainable. These approaches establish a set of design principles for next-generation low-power, high-reliability ferroelectric electronics.