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Isotope-Engineered Hexagonal Boron Nitride Films Synthesized by Plasma-Enhanced Chemical Vapor Deposition from Elemental Boron and Nitrogen Precursors

Authors: Congcong Ning; Fangzhu Qing; Qinglong Zhu; Xiaomeng Guo; Hao Zhang; Jun Luo; Jiawei Li; Hongwei Zhu; Xuesong Li

DOI: 10.1007/s40843-025-3862-xStatus: Verified Translated Edition
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Key Findings in This Report

• • PECVD using elemental B and N2 achieves wafer-scale hBN growth on Cu substrates, with monolayer flakes ~1 nm thick and uniform over the entire flake, enabling scalable production for industrial integration. • • Isotopic enrichment (10B, 11B, 14N2, 15N2) yields tunable phonon mode shifts that quantitatively match harmonic oscillator predictions, providing precise control over thermal and optical properties. • • Dynamic B source switching enables fabrication of in-plane h10BN-h11BN heterostructures, a previously unexplored architecture for quantum and phononic engineering. • • The growth follows Frank-van der Merwe (layer-by-layer) mode, with first-layer growth taking longer (e.g., 30 min vs. 10 min for subsequent layers in similar PECVD), indicating van der Waals epitaxy on pre-existing hBN surfaces.